Title:
二元細孔シリカ及びその製造方法
Document Type and Number:
Japanese Patent JP4641813
Kind Code:
B2
Abstract:
To provide a binary porous silica having a large nano-pore size, a high breakage load value, and a reduced pulverization at the time of filling or using, and a method for manufacturing above-mentioned binary porous silica with good reproducibility and efficiently.
The binary porous silica is characterized in that nano-pores having the mean diameter in a range of 5-50 nm and macro-pores having the mean diameter in a range of 0.1-20 μm are formed therein, and in that the volume of the nano-pores is in the range of 0.4-1.5 cm
COPYRIGHT: (C)2006,JPO&NCIPI
Inventors:
Satoshi Sato
Ryoji Takahashi
Ishizuke Masanari
Katsuhiro Matsutani
Naoki Mikami
Ryoji Takahashi
Ishizuke Masanari
Katsuhiro Matsutani
Naoki Mikami
Application Number:
JP2005027064A
Publication Date:
March 02, 2011
Filing Date:
February 02, 2005
Export Citation:
Assignee:
National University Corporation Chiba University
Tokuyama Corporation
Tokuyama Corporation
International Classes:
C01B33/157; B01J20/10; B01J20/28; B01J21/08; B01J32/00; B01J35/10
Domestic Patent References:
| JP2004285611A | ||||
| JP2004250387A | ||||
| JP2002080216A | ||||
| JP2002080217A |
Foreign References:
| WO2002085785A1 |
Other References:
高橋亮治他,水ガラスからの二元細孔シリカの作製とその結晶化,触媒,日本,2003年 9月10日,Vol.45,No.6,P.451-453