Title:
EUVミラー
Document Type and Number:
Japanese Patent JP4901874
Kind Code:
B2
Abstract:
A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.
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Inventors:
Fergal O'Reilly
Patrick Haden
Gerrard O'Sullivan
Padraig Dunn
Patrick Haden
Gerrard O'Sullivan
Padraig Dunn
Application Number:
JP2008538280A
Publication Date:
March 21, 2012
Filing Date:
October 23, 2006
Export Citation:
Assignee:
University College Dublin, National University of Ireland, Dublin
International Classes:
H01L21/027; G02B5/08; G21K1/06; G21K5/08; H05G2/00
Domestic Patent References:
| JP2009500796A | ||||
| JP2005129936A | ||||
| JP2006019510A | ||||
| JP5343297A | ||||
| JP2003197514A |
Attorney, Agent or Firm:
Mitsuo Tanaka
Takuji Yamada
Mikio Takeuchi
Takuji Yamada
Mikio Takeuchi