Title:
EB DIRECT WRITING DEVICE AND OPTIMIZING METHOD OF BEAM SIZE
Document Type and Number:
Japanese Patent JP3344389
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an EB direct writing device and an optimizing method of a beam size for improving accuracy in compensation of a beam size in vari able molding and matching the size at both partial batch and variable molding.
SOLUTION: In an optimizing method of a beam size, a beam scan waveform at a reference pattern on a batch aperture is considered as a reference beam size. Several pattern sizes are formed in variable molding for a beam scan waveform as the reference beam size waveform to generate beam scan waveforms with different sizes. At the same time a correlation with the reference beam size waveform is calculated.
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Inventors:
Kazuaki Ejiri
Application Number:
JP31220599A
Publication Date:
November 11, 2002
Filing Date:
November 02, 1999
Export Citation:
Assignee:
NEC
International Classes:
H01J37/04; G03F7/20; G21K5/04; H01J37/09; H01J37/305; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; H01J37/04; H01J37/09; H01J37/305
Domestic Patent References:
| JP10149972A | ||||
| JP1083945A | ||||
| JP661129A | ||||
| JP1126352A | ||||
| JP1239924A |
Attorney, Agent or Firm:
Shiroyuki Hori