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Title:
EL ELEMENT AND MANUFACTURE THEREOF
Document Type and Number:
Japanese Patent JPH04324279
Kind Code:
A
Abstract:

PURPOSE: To provide uniformity of brightness distribution in an EL emitting end surface even with ununiformity of film thickness and film quality in an EL emitting part and a light waveguide path by providing a structure such that the EL emitting part is provided on a substrate with a length thereof changed in accordance with a position in the lengthwise direction of an EL element.

CONSTITUTION: An EL element is prepared to measure brightness distribution by using a low-expansion glass as a substrate 1, SiON film as a light waveguide layer 2 and layer constitution of order successively of an ITO electrode/Si3N4/ZnSi3N4/AI electrode from a waveguide path side as an EL emitting part 3. Measurement is performed by a luminous energy sensor to transmit the luminous energy one by one to an arithmetic device while moving the luminous energy sensor successively in the lengthwise direction of the EL element, and a length in a light emitting direction of the EL emitting part in each position is calculated by the arithmetic device. An etching shape of the part 3 is changed so that the part 3 is lengthened in a part of low brightness and shortened in a part of high brightness to obtain an element of small unevenness of brightness in the lengthwise direction of the EL element. In this way, the EL element of uniform brightness in the lengthwise direction of the EL element can be obtained.


Inventors:
Akiyama, Shoichi
Application Number:
JP1991000122300
Publication Date:
November 13, 1992
Filing Date:
April 24, 1991
Export Citation:
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Assignee:
RICOH CO LTD
RICOH RES INST OF GEN ELECTRON
International Classes:
G02B6/122; G02B6/12; G09F9/30; H05B33/02; H05B33/12; H05B33/14; (IPC1-7): G02B6/12; G09F9/30; H05B33/02; H05B33/14