Title:
ELECTRET AND MANUFACTURING METHOD THEREOF
Document Type and Number:
Japanese Patent JP2003282360
Kind Code:
A
Abstract:
To configure an electret hard to discharge, even if it is used in an environment having a high humidity.
A manufacturing method of the electret includes a process for forming a charged film 2, comprising an SiO2 film on a substrate 1 by a sputtering method or a depositing method, a process for so subjecting the substrate 1 having the formed SiO2 film to a steam processing as to process it in the environment having high temperature and high humidity, and a process for subjecting thereafter the charged film 2 to a charging processing by a charger of such type as corona-discharge.
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Inventors:
MINAMI UCHITSUGU
OTSUJI TAKAHISA
SUGIMORI YASUO
OTSUJI TAKAHISA
SUGIMORI YASUO
Application Number:
JP2002086645A
Publication Date:
October 03, 2003
Filing Date:
March 26, 2002
Export Citation:
Assignee:
MINAMI UCHITSUGU
HOSIDEN CORP
HOSIDEN CORP
International Classes:
H04R19/01; H01G7/02; (IPC1-7): H01G7/02; H04R19/01
Attorney, Agent or Firm:
Shuichiro Kitamura
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