PURPOSE: To obtain the title film excellent in transparency, gas impermeability and electric conductivity by laminating a thin metal layer and a thin silicon oxide layer on at least one side of a synthetic resin film.

CONSTITUTION: The thin layer (b) of silicon oxide represented by a formula SiOX (where 1≤X<2) is formed in about 500-1000 thickness on one side or both sides of a film (a) of synthetic resin such as polyethylene terephthalate by electron beam heating and vapor deposition with silicon monoxide as an evaporating source. A metal (alloy) such as Al, Ni or Cr is then vapor-deposited on the surface of the thin layer to form a thin layer (c) in about 30-100 thickness. The layers are preferably laminated with the order of (a), (b) and (c) or (a), (c), and (b). The resulting title film is suitable for use as a packing material.