ELECTROCHEMICAL OXIDATION METHOD, FIELD EMISSION TYPE ELECTRON SOURCE, AND METHOD FOR MANUFACTURING THE SAME

Japanese Patent JP2004047970

A

To provide an electrochemical oxidation method for reducing the fluctuation in the characteristics of an electronic device.

When manufacturing a field emission type electronic source being an electronic device by using an electrochemical oxidation method, a control part 37 preliminarily calculates a voltage increase V0 due to the resistance of electrolyte B based on a resistance detected by a resistance detecting part 35. Afterwards, a DC current source 32 is controlled so that a constant current can flow from a DC current source 32 to start the oxidation treatment of a semiconductor layer formed in an object 30 to be treated. Correction processing is operated by subtracting the voltage increase V0 from a detected voltage V obtained by a voltage detecting part 36, and when the corrected voltage Vt reaches a specific upper limit voltage V1, the output of the DC current source 32 is stopped so that the oxidation treatment can be ended.

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WATABE YOSHIFUMI
AIZAWA KOICHI
KOMODA TAKUYA
HATAI TAKASHI

JP2003134895A

February 12, 2004

May 13, 2003

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MATSUSHITA ELECTRIC WORKS LTD

H01J9/02; H01J1/312; H01L21/316; H01L29/06; H01L29/66; (IPC1-7): H01L21/316; H01J1/312; H01J9/02; H01L29/06; H01L29/66

Keisei Nishikawa
Atsuo Mori

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