To obtain the subject composition exhibiting excellent reflection preventing function, antistatic ability, pattern transfer function, etc., by making the composition include a quaternary ammonium salt and an organosilicon polymer containing a specific polysilane.
This composition comprises at least (A) a quaternary ammonium salt (preferably a nitrogen-containing heterocyclic ammonium salt) and (B) an organosilicon polymer containing a polysilane having at least one repeating unit selected from repeating units of formula I and formula II (R1 and R2 are each a 1-20C alkyl, aryl or aralkyl). Preferably the component A contains a long-chain alkyl of ≥5 methylene carbons. The composition can form a reflection preventing film when it is applied to a substrate in the production of a semiconductor apparatus. Consequently the objective composition functioning as an electroconductive reflection preventing film having reflection preventing function, pattern transfer function and antistatic function can be provided.
MATSUMOTO KAZUNORI
HAYASE SHUJI
SATO YASUHIKO
NAKASUGI TETSUO
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