To provide an electrode member which makes stable deposition possible by suppressing the reaction with a material for vapor deposition composed of a zinc oxide as a principal component and a deposition system equipped therewith.
The electrode member 42 holds the material R for vapor deposition and guides a plasma beam or electronic beam to the material R for vapor deposition. The electrode member 42 has an electrode body 56 which is formed of a conductive material having thermal conductivity higher than that of a tungsten-base material, a tungsten layer 58 which is formed of a tungsten-base material and covers at least the surface of the electrode body 56 coming into contact with the material R for vapor deposition and a film 60 which is formed of a material having oxidation resistance and covers the exposed surface of the electrode body 56.
| JPH0387360A | 1991-04-12 | |||
| JPH10310864A | 1998-11-24 | |||
| JP2002241926A | 2002-08-28 | |||
| JPS6389963U | 1988-06-10 |
Shiro Terasaki
Yoshiki Kuroki
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