PURPOSE: To obtain the title composition which has excellent flexibility and adhesiveness, is nontacky at ordinary temperature, and allows close contact of a mask film when printing an image by using a specified block copolymer, an alkali-soluble polyphenol, and a positive sensitizing agent as the constituents.
CONSTITUTION: The title composition comprises 100-5 pts.wt. AB type or ABA type block copolymer (A) containing a high-molecular chain segment having a degree of polymerization of 20-5,000, formed from a radical-polymerizable unsaturated monomer having neither an (anhydrous) carboxyl group nor an amino group and a high-molecular chain segment having a degree of polymerization of 20-5,000, formed from a radical-polymerizable unsaturated monomer containing at least 40mol% radical-polymerizable unsaturated monomer having an (anhydrous) carboxyl group or an amino group; 0-95 pts.wt. alkali-soluble polyphenol (B); and 1-100 pts.wt. positive sensitizing agent (C). This composition is excellent in flexibility and adhesiveness, is nontacky at ordinary temperature, and has excellent resistance both to an etching solution and a plating solution; therefore, when used for, e.g. manufacturing a printed circuit board, it can improve the accuracy of patterning and reduce the fraction defective.
HIMORI SHUNICHI
KADA MASUMI
