To provide an electroluminescent element and an electroluminescent display device having high brightness and high efficiency.
A plane glass substrate 101 is formed in which a pattern in which a plurality of TFT circuits and ITO lower electrodes which are positive poles are arranged, and is tilted at an angle of 30 degrees to the horizontal face and fixed, a positive hole transportation layer 103 is film-formed on the glass substrate 101 by an IJP method, and by film-forming the organic EL layer 104 on it by the IJP method in a nitrogen atmosphere, the organic EL layer 104 is formed which has a film-thickness distribution tilted to a substrate face. Afterwards, on a light emitting layer composed of the positive hole transportation layer 103 and the organic EL layer 104, a silver-magnesium alloy is film-formed by a vapor deposition method so that the film-thickness is 100 nm, and the upper electrode 105 which is a negative electrode is formed. Then the electroluminescent display device is manufactured by using an EL element manufactured by the above method.
COPYRIGHT: (C)2005,JPO&NCIPI
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Masatake Shiga