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Title:
ELECTROLYTIC COPPER FOIL AND METHOD OF ELECTROPOLISHING GLOSSY SURFACE OF THE ELECTROLYTIC COPPER FOIL
Document Type and Number:
Japanese Patent JP2010059547
Kind Code:
A
Abstract:

To inexpensively provide a low-profiled copper foil for a printing wiring board by improving adhesiveness of the glossy surface of the copper foil to a resist as well as adhesion of this glossy surface with a resin substrate.

The electrolytic copper foil 1 is provided with the irregular and undefined-length veined undulation formed by electropolishing on the glossy surface 4 thereof. An electropolishing method includes electropolishing the glossy surface of the electrolytic copper foil using a sulfuric acid-copper sulfate bath as an electrolyte. Alternatively, the method includes arranging an anode 3 on the rough surface side 2 of the electrolytic copper foil and a cathode 5 on a glossy surface side, performing a smooth plating treatment on the rough surface by electrolysis, and then performing a reverse electropolishing treatment on the glossy surface.


Inventors:
AKASE FUMIAKI
IIDA KAZUHIKO
Application Number:
JP2009229801A
Publication Date:
March 18, 2010
Filing Date:
October 01, 2009
Export Citation:
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Assignee:
NIPPON MINING CO
International Classes:
C25F3/16; C23C28/00; C25D7/06; H05K1/09; H05K3/38
Domestic Patent References:
JPH08158100A1996-06-18
JPH10168596A1998-06-23
JPH10310881A1998-11-24
JPH08120499A1996-05-14
Attorney, Agent or Firm:
Isamu Ogoshi