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Title:
ELECTROLYTIC PLATING METHOD
Document Type and Number:
Japanese Patent JPS5362740
Kind Code:
A
Abstract:
A process for the electrolytic deposition of a metal layer on an article comprised of zirconium or a zirconium alloy is disclosed. The article is activated in an aged aqueous solution comprising from about 10 to about 20 grams per liter ammonium bifluoride and from about 0.75 to about 2 grams per liter of sulfuric acid. The solution is aged by immersion of pickled zirconium in the solution for at least about 10 minutes. The loosely adhering film formed on the article in the activating step is removed and the article is contacted with an electrolytic plating solution containing the metal to be deposited on the article in the presence of an electrode receiving current.

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Inventors:
ROBAATO ERANDERU DONAGII
Application Number:
JP11868977A
Publication Date:
June 05, 1978
Filing Date:
October 04, 1977
Export Citation:
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Assignee:
GEN ELECTRIC
International Classes:
C25D5/38; C25D21/08; G21C3/07; (IPC1-7): C25D5/38; C25D17/00
Foreign References:
US2711389A1955-06-21



 
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