PURPOSE: To extremely reduce the positional deviation of a lithography pattern at the initial and end of aligning by providing a hot plate in a sub chamber, and preheating a holder for holding a substrate.

CONSTITUTION: A sub chamber 2 is adhered to the side of the main chamber 1 of an electron beam aligner, a hot plate 9 is provided in the chamber 2, a holder 4 holding a substrate 3 is previously heated to a predetermined temperature, and a lithography with an electron beam is then conducted. Accordingly, the influence of heat to the holder, i.e., the influence of heat generated at an electron beam barrel provided at the top of the chamber 1 can be reduced. Thus, it can prevent the position of a regulating reference mark for detecting the origin of the beam from deviating due to the thermal deformation of the holder while a long lithography time to cause the lithography pattern to deviate.