ELECTRON BEAM ALIGNER

Title:

ELECTRON BEAM ALIGNER

Document Type and Number:

Japanese Patent JPH0689850

Kind Code:

A

Abstract:

PURPOSE: To realize exposure of a fine pattern by providing a heat absorber that keeps the temperature of an electron lens system to minimize its heat radiation.

CONSTITUTION: An electromagnetic lens 43 is provided for converging an electron beam 41 onto a wafer 42 for reduction projection. The electron beam is directed to desired positions on the wafer by a deflection coil 44. A heater 46 is provided for compensating for changes in quantity of heat generated by the deflection coil. The deflection coil 44, the heater 46 and the electromagnetic lens 43 are included in an electron lens system 7B. The heat 47 generated from those members is absorbed by a heat absorber 50. The electron lens system is kept at low temperature, and thus its radiation of heat to the wafer is minimized. In this manner, exposure for a fine pattern is realized.

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Inventors:

DAIKYO YOSHIHISA
SAKAMOTO JUICHI
YAMADA AKIO
YASUDA HIROSHI

Application Number:

JP24075892A

Publication Date:

March 29, 1994

Filing Date:

September 09, 1992

Export Citation:

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Assignee:

FUJITSU LTD

International Classes:

G03F7/20; G21K5/04; H01J37/141; H01J37/305; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; G21K5/04; H01J37/141; H01J37/305

Attorney, Agent or Firm:

Tadahiko Ito

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