ELECTRON BEAM ANALYSIS DEVICE AND ELECTRON BEAM ANALYSIS METHOD

Japanese Patent JP3454052

B2

PROBLEM TO BE SOLVED: To enable precise analysis by measuring a sample displacement quantity by means of an information detecting device such as a characteristics X-ray, a secondary electron having higher detection efficiency than an Auger electron, or a transmission electron and correcting a analysis position.
SOLUTION: When an analysis start signal is fed to a control unit 24, the control unit 24 perform sample irradiation when an electron beam is statically stopped at a position corresponding to a cross marker address, i.e., at an analysis position. A characteristics X-ray 12 generated by a sample due to an electron beam irradiation is detected by an X-ray detector 13, information of element distribution can be obtained by an intensity rate of a characteristics X-ray corresponding to a target element. After an electron beam is statically stopped about 10 seconds and analyzed, fetching of X-ray detecting signal is stopped, an electron beam is sample-scanned at the same magnification, a sample scan image is obtained again, and it is stored in a video memory of 1024×1024 picture elements in the control unit 24. Displacement with the previous scan image can be prevented because a drift quantity can be obtained from correlation of the sample scan image stored in two video memories, for example.

Hisaya Murakoshi

JP32505996A

October 06, 2003

December 05, 1996

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株式会社日立製作所

G01N23/225; G01N23/227; H01J37/20; H01J37/252; H01J37/28; (IPC1-7): H01J37/252; H01J37/20; H01J37/28

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Yasuo Sakuta

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