ELECTRON BEAM DEVICE, AND MANUFACTURING METHOD OF DEVICE USING THE SAME

Title:

ELECTRON BEAM DEVICE, AND MANUFACTURING METHOD OF DEVICE USING THE SAME

Document Type and Number:

Japanese Patent JP2003031171

Kind Code:

A

Abstract:

To provide an electron beam device enabled to obtain multi-beam by using an electron gun having one cathode, and to provide a manufacturing method of a device using the electron beam device.

The electron beam device irradiates an electron beam emitted from a cathode 63 having a plurality of protrusions to a plurality of openings of a plate with openings 3, and reduce-projects the electron beam passed through the openings on a sample. The plurality of openings on the plate with openings 3 are formed by etching a Si single crystal plate 21. The plurality of openings on the plate with openings 3 can be formed by metal coating. A square nock hole, for the positioning of θ-direction, is formed to the plate with openings 3, or the outer form of the plurality of openings on the plate with openings 3 has sides which are parallel with X-axis or Y-axis.

Inventors:

HAMASHIMA MUNEKI
NAKASUJI MAMORU
KATO TAKAO
NOMICHI SHINJI
SATAKE TORU

Application Number:

JP2001217858A

Publication Date:

January 31, 2003

Filing Date:

July 18, 2001

Export Citation:

Click for automatic bibliography generation Help

Assignee:

NIKON CORP
EBARA CORP

International Classes:

G21K1/02; G21K5/04; H01J9/14; H01J37/09; H01L21/66; (IPC1-7): H01J37/09; G21K1/02; G21K5/04; H01J9/14; H01L21/66

Attorney, Agent or Firm:

Kazuo Shamoto (5 outside)

Previous Patent: ELECTRON EMITTING NEGATIVE ELECTRODE, AND MANUFACTURING METHOD OF THE SAME

Next Patent: DEFLECTOR AND MANUFACTURING METHOD OF THE SAME, AND CHARGED PARTICLE EXPOSING DEVICE