To provide electron beam devices such as a scanning electron microscope and an electron beam drawing device wherein influences of an atmospheric pressure fluctuation and a low-frequency sound are eliminated.

When there is the atmospheric pressure fluctuation, an irradiation position of the electron beam on a sample under the atmospheric pressure fluctuation can be corrected if the amount of deflection of an electron beam is changed according to the amount of the atmospheric pressure fluctuation to offset the fluctuation of an image. In this case, Since the direction of movement of the image accompanying the atmospheric pressure fluctuation is always constant in each electron beam device, the compensation amount of the deflection amount of electron beam in a Y-direction versus the compensation amount of the deflection amount of electron beam in an X-direction is a ratio of δy/δx where δx is an X component and δy is a Y component of the amount of the movement of the image δ.