Title:
電子ビーム装置
Document Type and Number:
Japanese Patent JP4727206
Kind Code:
B2
Abstract:
To provide equipment for improving linearity by narrowing a beam width.
The electron beam equipment has an anode electrode 103 with a slit 104, a plurality of dips 101 arranged opposingly at one side of the anode electrode, arranges a work to be machined at the other side of the anode electrode, and applies electron beams through the slit 104 emitted from the plurality of dips 101 to the work to be machined. And the electron beam equipment may also have a means for applying a magnetic field in the emission direction of electrons.
COPYRIGHT: (C)2006,JPO&NCIPI
Inventors:
Sakutaro Yamaguchi
Application Number:
JP2004306514A
Publication Date:
July 20, 2011
Filing Date:
October 21, 2004
Export Citation:
Assignee:
YYL Corporation
International Classes:
H01J37/06; H01J37/073; H01J37/31; B23K15/08; H01J1/304
Domestic Patent References:
| JP5050267A | ||||
| JP2003197511A | ||||
| JP2001099998A | ||||
| JP2002318300A | ||||
| JP54006864B1 |
Attorney, Agent or Firm:
Kato Asamichi