Title:
電子ビーム装置
Document Type and Number:
Japanese Patent JP6460501
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To achieve a longer service life of a filament of an electron beam device by reducing the number of ions which reach the filament.SOLUTION: An electron gun unit 110 for electron beam generation generates an electron beam 140. An object irradiated with the electron beam 140 is placed in a sample chamber 120. A TMP 162 and a TMP 164 exhaust the electron gun unit 110. A vacuum chamber VC1 is exhausted by the TMP 162. A vacuum chamber VC2 is connected to the vacuum chamber VC1 via an opening 151 and also connected to the sample chamber 120, and exhausted by the TMP 164. A filament 111 is arranged in the vacuum chamber VC1, and emits thermal electrons. An anode 113 is arranged in the vacuum chamber VC2, and guides the thermal electrons via the opening 151 to generate the electron beam 140.SELECTED DRAWING: Figure 3
Inventors:
Kiyoshi Tsuru
Toru Nakajima
Murakami Noon
Toru Nakajima
Murakami Noon
Application Number:
JP2018020633A
Publication Date:
January 30, 2019
Filing Date:
February 08, 2018
Export Citation:
Assignee:
NEC Platforms, Ltd.
International Classes:
H01J37/06; H01J37/065
Domestic Patent References:
| JP51103351U | ||||
| JP5568194A | ||||
| JP58133253U | ||||
| JP60147144U | ||||
| JP6221474A | ||||
| JP9259811A |
Attorney, Agent or Firm:
Ken Ieiri
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