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Patent Searching and Data


Title:
ELECTRON BEAM DEVICE
Document Type and Number:
Japanese Patent JPS5952766
Kind Code:
A
Abstract:

PURPOSE: To adjust the position of an analyzer stage speedily and easily, by irradiating a sample for adjustment by an electron beam to four corners in deflecting successively from above, and inputting secondary electrons radiated from the four corners to a secondary electron detector through analyzing grids, and displaying analytic curves of the four corners on an oscilloscope simultaneously.

CONSTITUTION: When the electron beam EB passes between deflecting coils 331 and 332, the electron beam is deflected in every duplicated section of the (x) and (y) outputs of a deflecting voltage generator 334 to illuminate corresponding positions 1W4 in a visual field area 111. Radiated secondary electron SE is supplied to the secondary electron detector to generate a specific electric signal, which is swept by a saw-tooth wave to display four analytic curves of the respective irradiation points on the oscilloscope 32 at the same time. However, when the analyzer stage 20 is moved in observing the screen, consequently the four analytic curves appears as one coincide analytic curve, so that it is adjusted easily.


Inventors:
ITOU AKIO
GOTOU YOSHIAKI
ISHIZUKA TOSHIHIRO
OZAKI KAZUYUKI
FURUKAWA YASUO
Application Number:
JP16306282A
Publication Date:
March 27, 1984
Filing Date:
September 21, 1982
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
G01R31/302; G01R19/155; H01J37/26; (IPC1-7): G01R19/00
Attorney, Agent or Firm:
Aoki Akira