To provide an electron beam drawing apparatus capable of compensating the deviation of a drawing position by an electron beam caused by a mechanical error, misalignment of an optical axis, optical distortion or the like, and performing a highly precise drawing.

In the electron beam drawing apparatus, an output signal from a deflection amplifier 46Y and a signal, corresponding to an angle deviation from a deflection amplifier 46X, are outputted to change the deflection direction of an electron beam (to rotate), in order to compensate for the angle deviation between a linear movement direction of the rotation stage and the deflection direction of an actual electron beam, when the electron beam is deflected by a first command signal DO(Y) from a first commanding device 42 that deflects the electron beam. An electron beam is made to scan so as to produce a solid image of an element constituting a desired pattern. A second command signal MO(X), MO(Y) from the first commanding device 42 is converted into a second command signal MO(X)', MO(Y)' by a conversion table of a compensation circuit 52 and makes the commanded position of the electron beam coincide with the actual scanning position.