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Title:
ELECTRON BEAM EXCITATION PLASMA GENERATING EQUIPMENT
Document Type and Number:
Japanese Patent JP2003007498
Kind Code:
A
Abstract:

To provide acceleration electrode structure, which prevents adhering of an insulating substance to an acceleration electrode when processing a high temperature insulation substance, and stabilizes acceleration of an electron beam for a long time, in electron beam excitation plasma generating equipment, which has the acceleration electrode installed in a process room.

In the electronic beam excitation plasma generating equipment, in which the acceleration electrode 10 is formed in a position, which counters an electron beam outlet 8 in a process chamber 3, by making the acceleration electrode 10 hollow to make it the header for inactive gas, and further by forming a through hole 13, which is opened in the direction, which counters the outlet 8, it is made to operate while supplying and discharging atmosphere gas, such as helium or the like, which is not concerned with the reaction, to the header for inactive gas from the through holes.


Inventors:
HASEGAWA TAKESHI
KASA YOSHITOKU
MORI YUKITAKA
Application Number:
JP2001184627A
Publication Date:
January 10, 2003
Filing Date:
June 19, 2001
Export Citation:
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Assignee:
KAWASAKI HEAVY IND LTD
International Classes:
G21K5/00; B01J19/08; C23C16/50; G21K5/04; H01L21/31; H05H1/24; H05H1/46; (IPC1-7): H05H1/24; B01J19/08; C23C16/50; G21K5/00; G21K5/04; H01L21/31
Domestic Patent References:
JP2000150194A2000-05-30
JPH1167491A1999-03-09
JPH10326695A1998-12-08
JPH0314223A1991-01-22
JPH06291063A1994-10-18
Attorney, Agent or Firm:
Seki Seiji