Title:
電子ビーム露光装置
Document Type and Number:
Japanese Patent JP4006054
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To easily change the sizes of a plurality of electron beams at the same time by changing the focal distance of an illuminating electrooptic system when a plurality of intermediate images forms the images of a plurality of electron sources on a substrate to be exposed through a demagnification electrooptic system. SOLUTION: Nearly parallel electron beams from an illuminating electrooptic system 2 are made incident upon an elemental electrooptic system array 3. The array 3 is formed by arranging a plurality of elemental electrooptic systems each composed of an opening, an electrooptic system, and a blanking electrode in the direction perpendicular to the optical axis. The array 3 forms a plurality of the intermediate images of electron sources and the intermediate images are demagnified and projected by means of a demagnification electrooptic system and form the images of the electron sources on a wafer in nearly equal sizes. When the focal distance of the system 2 is changed, the sizes of the intermediate images of the electron sources can be changed and, at the same time, the sizes of the images of the electron sources formed on the wafer can also be changed.
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Inventors:
Masato Muraki
Application Number:
JP13225997A
Publication Date:
November 14, 2007
Filing Date:
May 22, 1997
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; H01J37/21; H01L21/027
Domestic Patent References:
| JP61284992A | ||||
| JP60244025A | ||||
| JP5251315A | ||||
| JP64020619A | ||||
| JP62115715A | ||||
| JP60261134A | ||||
| JP58119637A | ||||
| JP52088571U | ||||
| JP61042129A |
Attorney, Agent or Firm:
Keizo Nishiyama
Yuichi Uchio
Yuichi Uchio