Title:
ELECTRON BEAM EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JPS5572032
Kind Code:
A
Abstract:
PURPOSE:To correct vertical tilting of a pattern through vertical deflection of an electron beam by counting electric pulses corresponding to the substrate vertical movement in synchronization with the horizontal electron beam scanning. CONSTITUTION:Pulses LPUP from laser length meter due to forward movement FWD of the mask M is counted. When the mask is moved a given distance in Y direction, the beam horizontal deflection is synchronized by synchronizing pulses. This synchronization pulse generation causes the pulses LPUP to be counted CTRA, and the circuit DAC-YC to produce a step analog signal, which is amplified AMP to control the Y-axis deflection. This allows the pattern to be corrected from X- axis tilting to the horizontal direction. For more accurate correction, interpolation pulses are given via the counter CTRB to the circuit DAC-YC. To expose the frame F2, the pattern tilting is corrected by the pulses LPDN corresponding to the reverse movement of the mask M and the interporation pulses. This provides a high-accuracy image.
Inventors:
KUSAKABE HIDEO
Application Number:
JP14630578A
Publication Date:
May 30, 1980
Filing Date:
November 27, 1978
Export Citation:
Assignee:
TOKYO SHIBAURA ELECTRIC CO
International Classes:
H01J37/305; H01J37/302; H01L21/027; (IPC1-7): H01J37/305; H01L21/30
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