Title:
ELECTRON BEAM EXPOSURE METHOD
Document Type and Number:
Japanese Patent JPS5357974
Kind Code:
A
Abstract:
PURPOSE:To reduce the damages that the substrate to be treated receives during rediation and eliminate the need for special annealing process by rediating an electron beam to the resist film while maintaining the substrate to be greated which is deposited with the resist film for electron beam at a high temperature.
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Inventors:
KOYAMA HIROSHI
Application Number:
JP13358076A
Publication Date:
May 25, 1978
Filing Date:
November 05, 1976
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
H05K3/00; G03F7/20; H01L21/027; H01L21/312; H05K3/06; (IPC1-7): G03F7/20; H01L21/312; H05K3/06