Title:
電子ビーム露光システム
Document Type and Number:
Japanese Patent JP5053514
Kind Code:
B2
Abstract:
The invention relates to an electron optical system for receiving a plurality of beamlets, comprising a first electrostatic lens array for focusing a plurality of beamlets; a modulation array comprising a plurality of modulators for modulating the intensity of the beamlets; a scan deflector array comprising a plurality of electrostatic scan deflectors for deflecting a portion of the beamlets in a predetermined direction; and a second electrostatic lens array for focusing the deflected beamlets.
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Inventors:
Weland, Marco Jean-Jaco
Camphor beak, bert jean
Kruit, Peter
Van Bean, Alexander Hendrik Vincent
Camphor beak, bert jean
Kruit, Peter
Van Bean, Alexander Hendrik Vincent
Application Number:
JP2004548160A
Publication Date:
October 17, 2012
Filing Date:
October 30, 2003
Export Citation:
Assignee:
Mapper Lithography IPB.V.
International Classes:
H01L21/027; A61N5/00; G01Q30/02; G01Q30/08; G03B1/00; G03F7/20; H01J37/08; H01J37/30; H01J37/304; H01J37/305; H01J37/317
Domestic Patent References:
| JP2003297732A | ||||
| JP97538A | ||||
| JP7192682A | ||||
| JP2000252207A | ||||
| JP6261328A |
Attorney, Agent or Firm:
Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Katsumura Hiro
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Katsumura Hiro