Title:
電子ビーム発生装置、電子ビーム露光装置、および製造方法
Document Type and Number:
Japanese Patent JP6738067
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an electron beam generating source capable of easily output a plurality of electron beams with high precision.SOLUTION: The present invention provides an electron beam generator which comprises an electron discharge part that discharges an electron from a first surface; and a graphene layer that is provided on a first surface side of the electron discharge part, and make the electron discharged from the electron discharge part to pass through, and a manufacturing method of the electron beam generator. The graphene layer may output a diffraction wave of an electron discharged from the electron discharge part. The graphene layer may be formed so as to overlap one or a plurality of graphenes of a monoatomic layer.SELECTED DRAWING: Figure 1
Inventors:
Akira Kojima
Hiroshi Miyaguchi
Naokatsu Ikegami
Masayoshi Esashi
Nobuyoshi Koshida
Ryutaro Suda
Hiroshi Miyaguchi
Naokatsu Ikegami
Masayoshi Esashi
Nobuyoshi Koshida
Ryutaro Suda
Application Number:
JP2017037623A
Publication Date:
August 12, 2020
Filing Date:
February 28, 2017
Export Citation:
Assignee:
Tohoku University
National University Corporation Tokyo University of Agriculture and Technology
National University Corporation Tokyo University of Agriculture and Technology
International Classes:
H01L21/027; G03F7/20; H01J1/308; H01J1/48; H01J37/073; H01J37/305
Domestic Patent References:
| JP2006040725A | ||||
| JP2007329220A | ||||
| JP2001332168A |
Foreign References:
| US20150243468 | ||||
| WO2011025045A1 |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation