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Patent Searching and Data


Title:
ELECTRON BEAM HOLOGRAPHY DEVICE
Document Type and Number:
Japanese Patent JPS6465762
Kind Code:
A
Abstract:

PURPOSE: To form a stereophonic image with high precision and in a short time by electron beam divided into objective wave and reference waves are overlapped after the relative phase difference is varied by a specified method.

CONSTITUTION: Electron beam of an electron microscope 101 is divided into an objective wave passing through a specimen 104 and other reference waves by an electron beam biprism 12, and the relative phase difference between the two waves is varied by a phase control device 13 to be superposed over an image sensing device 15. Alteration of the relative phase difference between the two waves is made by either (a) changing the magnetic flux 7 penetrating between the reference wave 5 and objective wave 6, (b) accelerating/decelerating by electric field through an electrostatic phase shifter 9 to the reference wave 5, or (c) inserting a phase shifter plate 10 to the reference wave 5. The objective wave 6 is superposed over the reference wave 5 with the relative phase difference altered specifically, and thus the phase distribution of the objective wave 6 can be measured three-dimensionally with high precision in a short time.


Inventors:
HASEGAWA SHUJI
ENDO JUNJI
OSAGABE NOBUYUKI
TONOMURA AKIRA
Application Number:
JP22022887A
Publication Date:
March 13, 1989
Filing Date:
September 04, 1987
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G01Q30/02; G03H5/00; H01J37/04; H01J37/22; H01J37/26; (IPC1-7): H01J37/04; H01J37/26
Domestic Patent References:
JPS59210472A1984-11-29
JPS60117637A1985-06-25
Attorney, Agent or Firm:
Junnosuke Nakamura