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Title:
ELECTRON BEAM IMAGE RECORDING SYSTEM USING HIGH POLYMER LIQUID CRYSTAL
Document Type and Number:
Japanese Patent JPS59170818
Kind Code:
A
Abstract:

PURPOSE: To record an electron microscope image with high resolution by irradiating high polymer liquid crystal with an electron beam directly.

CONSTITUTION: The high polymer liquid crystal is used while enclosed in a proper cell. This cell consists of, for example, two protection films 3 and 4 sandwiching the liquid crystal 1 from above and below, a spacer 5, and an external frame for fixing them. The protection film 3 on the side where an electron beam 8 is incident should be superior in electron beam transmittivity and light transmittivity. The other protection film 4 sandwiching the liquid crystal 1 is formed by vapor-depositing conductive material. This conductive coating 2 contacts the high polymer liquid crystal 1 and is earthed to the external frame by conductive resin material. When the high polymer liquid crystal 1 is irradiated with an electron beam, the transition of the liquid-crystal structure occurs, which is utilized to record an electron microscope image with high resolution.


Inventors:
MATSUDA JINICHI
Application Number:
JP4307683A
Publication Date:
September 27, 1984
Filing Date:
March 17, 1983
Export Citation:
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Assignee:
TOYO SODA MFG CO LTD
International Classes:
G02F1/13; G02F1/133; G09G3/18; (IPC1-7): G02F1/13; G09F9/00
Domestic Patent References:
JPS5781233A1982-05-21