To provide a method for inexpensively and automatically inspecting an X-ray mask and an equivalent conductive substrate by using a charged particle.
The position of a substrate is measured for accurately positioning a charged particle beam onto the substrate. The charged particle beam is deflected to the desired position of the measured substrate. The desired position on a substrate surface is scanned by the charged particle beam. As a result, at least one type is detected in three types, namely a secondary charged particle, a backward scattering charged particle, and a transmission charged particle that are generated from the upper and bottom surfaces of the substrate. According to the above steps, the substrate is automatically inspected by using the charged particle.
BRODIE ALAN D
CHADWICK CURT
DESAI ANIL
DOHSE HANS
EMGE DENNIS
GREEN JOHN
JOHNSON RALPH
KIRK CHRIS
LING MING-YIE
MCMURTRY JOHN
BECKER BERRY
JOHN GIBIRISUKO
PAUL RAY
ROBINSON MIKE
PAUL SANDLAND
SIMMONS RICHARD
SMITH DAVID E A
TAYLOR JOHN
VENEKLASEN LEE
WALTERS DEAN
WIECZOREK PAUL
WONG SAM
DUTTA APRIL
LELE SURENDRA
ROUGH KIRKWOOD
PEARCE-PERCY HENRY
JAU JACK Y
JESSIE LYNNE
NGUYEN HOI ZA
OYANG YEN-JEN
HUTCHESON TIMOTHY L
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