To reduce loss of electron beams, enhance electron beam density, realize compactness, and enable a high speed treatment in an electron beam irradiation device having a plane type electron beam source.
In this electron beam irradiation device, a common electrode 1 and an electron generating electrode 3 having an aperture 31 for electron generation are installed at respective faces of a ferroelectric layer 2. An accelerating electrode 4 having an aperture 41 for electron focusing is provided by separating by a prescribed distance. The loss of the electronic beams are reduced by making aperture ratio of the accelerating electrode 4 larger than that of the electron generating electrode 3 of the electron beam source. Furthermore, on the surface of the ferroelectric layer 2 of the electron beam source, MgO films or aluminum nitride films or the like are laminated which have high secondary electron discharge ability, and electron beam discharge density is enhanced. The compactness can be made even if the electron beam density is increased when an electron beam focusing plate is installed which is constituted of a metal mesh electrode and a plurality of layers of dielectric mesh as an electron focusing part. Furthermore, the electron irradiation efficiency can be doubled by making irradiating faces of the electron beams as both faces.
SAKURAI TAKESHI
Ohashi
Masanori Hirano
Hayashi Hiroki