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Title:
ELECTRON BEAM IRRADIATION DEVICE
Document Type and Number:
Japanese Patent JP2012035302
Kind Code:
A
Abstract:

To provide an electron beam irradiation device that prevents contamination of a vacuum chamber or electron gun by reducing an adverse effect due to an evaporation component incidental to the damage of an insulation coating, which could be led when irradiating with an electron beam at high energy, without giving rise to deterioration of a magnetic domain subdividing effect caused by the electron beam irradiation.

In the electron beam irradiation device, a shielding plate with a slit through which the electron beam passes, is arranged on the side of a metallic strip surface to which the electron beam is radiated, when electronic beam scanning is performed by the electron gun successively in the width direction of the running metallic strip.


Inventors:
YAMAGUCHI HIROSHI
HANAZAWA KAZUHIRO
OKABE SEIJI
OMURA TAKESHI
Application Number:
JP2010177689A
Publication Date:
February 23, 2012
Filing Date:
August 06, 2010
Export Citation:
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Assignee:
JFE STEEL CORP
International Classes:
B23K15/00; C21D8/12
Domestic Patent References:
JPH04231415A1992-08-20
JPH02229682A1990-09-12
JP2010109375A2010-05-13
JPS4926151A1974-03-08
JPS5185027U1976-07-08
JPS5348123U1978-04-24
JP2005210129A2005-08-04
JP2007507897A2007-03-29
JPS62290823A1987-12-17
Attorney, Agent or Firm:
Kenji Sugimura
Kiyoshi Kuruma
Yamaguchi Yusuke