Title:
ELECTRON BEAM LITHOGRAPHY APPARATUS
Document Type and Number:
Japanese Patent JPS5645025
Kind Code:
A
Abstract:
PURPOSE:To permit the correction of all the rotation error angles of an electron beam lithography apparatus without prealignment outside the apparatus by rotating a deflecting coil to correct the rotation error and feedbacking the correcting angle to the moving table. CONSTITUTION:A mark detection functioning unit 18 detects the mark end of a sample having reference marks, and a signal processing unit 17 obtains the barycentric coordinates of the two reference marks and calculates a rotation correcting angle theta. The signal corresponding to the angle causes a deflecting coil rotating source 11 to actuate a deflecting coil 16 to rotate by the rotation correcting angle. Thus, the rotation error angle theta made by the sample and a moving table 8 is corrected. This permits the rotation correction of the lithography field of even a sample which has a rotation error too large for an electrical correction.
Inventors:
ASANAMI KENICHI
HOSAKA SUMIO
HOSAKA SUMIO
Application Number:
JP12068179A
Publication Date:
April 24, 1981
Filing Date:
September 21, 1979
Export Citation:
Assignee:
CHO LSI GIJUTSU KENKYU KUMIAI
International Classes:
H01L21/027; H01J37/304; (IPC1-7): H01L21/30
Domestic Patent References:
| JPS494983A | 1974-01-17 | |||
| JPS53145475A | 1978-12-18 |