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Title:
ELECTRON BEAM LITHOGRAPHY DEVICE
Document Type and Number:
Japanese Patent JP2002299224
Kind Code:
A
Abstract:

To provide an electron beam lithography device which improves throughput.

The electron beam lithography device having a variable-area type or two-step deflection type electron beam positioning mechanism comprises sorter circuits 14, 16 for sorting figure data divided for shot or scan with respect to figure positions, memories 15, 17 for sectioning and storing the sorted figure data and a deflection control circuit 18 for reading the figure data sorted and stored in the memories on a nearest position first-read base.


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Inventors:
WAKIMOTO OSAMU
Application Number:
JP2001104220A
Publication Date:
October 11, 2002
Filing Date:
April 03, 2001
Export Citation:
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Assignee:
JEOL LTD
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Fujishima Ijima (1 outside)



 
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