Title:
ELECTRON BEAM MEASUREMENT DEVICE AND ELECTRON BEAM MEASUREMENT METHOD
Document Type and Number:
Japanese Patent JP2023178358
Kind Code:
A
Abstract:
PURPOSE: To provide an electron beam measurement device and an electron beam measurement method, which involve blocking an electron bream in real time after a predetermined period of time from real-time detection of an edge of a peak, thereby preventing irradiation to a pattern to prevent damage and shrinkage of the pattern.CONSTITUTION: An electron beam measurement device disclosed herein comprises: scanning means for scanning a lightly focused electron beam on a resist pattern obtained by replacing an organic solvent that evaporates in vacuum contained in a measurement target resist pattern with an ionic liquid that does not evaporate in vacuum; and measurement means for making measurement based on a signal waveform acquired by the scanning made by the scanning unit. Reducing evaporation of the organic solvent of the resist pattern in vacuum causes a reduction in shrinkage.SELECTED DRAWING: Figure 1
Inventors:
YAMADA KEIZO
Application Number:
JP2023176576A
Publication Date:
December 14, 2023
Filing Date:
October 12, 2023
Export Citation:
Assignee:
HORON KK
International Classes:
G01B15/00; G03F7/20
Attorney, Agent or Firm:
Morihiro Okada