Title:
ELECTRON BEAM PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2023063712
Kind Code:
A
Abstract:
To provide an electron beam processing device with which it is possible to improve the amount of an electron beam irradiated to a specific point of an object, even when the relative position of the object to an electron beam source does not change.SOLUTION: Provided is an electron beam processing device 1000 comprising an electron beam generation source 600, an irradiation control unit 700 for controlling the direction in which an electron beam is irradiated, and an electron beam passage unit 800 for passing the electron beam through a transmission window. The electron beam processing device further includes a rotary member (aperture housing 60) which is capable of holding the reduced pressure of the electron beam passage unit 800 and rotating while facing the electron beam generation source 600 and keeping air-tight. The transmission window 200 is provided to the rotary member in plurality, and their shape is linear. The transmission windows 200 are disposed in the circumferential direction of the rotary member, with the longitudinal direction of each transmission window being formed generally in the radial direction, and the irradiation control unit 700 scans an electron beam in the longitudinal direction of the transmission windows while rotating the rotary member so as to move the transmission windows 200.SELECTED DRAWING: Figure 1
Inventors:
ICHIMURA SATOSHI
KOJIMA HIROAKI
SUDO TETSUYA
ITO MAKOTO
KOJIMA HIROAKI
SUDO TETSUYA
ITO MAKOTO
Application Number:
JP2021173688A
Publication Date:
May 10, 2023
Filing Date:
October 25, 2021
Export Citation:
Assignee:
HITACHI LTD
International Classes:
G21K5/00; B23K15/00; G21K5/04
Attorney, Agent or Firm:
Patent Attorney Corporation Isono International Patent and Trademark Office