Title:
ELECTRON BEAM PROCESSING SYSTEM
Document Type and Number:
Japanese Patent JP2017220457
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an electron beam processing system.SOLUTION: An electron beam processing system includes a vacuum device, an electron gun, a sample holder, a control computer, and a diffraction device. The electron gun is installed in the vacuum device, and an electron beam is emitted from the electron gun. The sample holder is installed in the vacuum device. Operation of the electron beam processing system is controlled by the control computer. The diffraction device is installed in the vacuum device, and includes a two-dimensional nanomaterial. A vacuum pump device is connected to a vacuum chamber. After an electron beam transmits the two-dimensional nanomaterial, a transmission electron beam and a plurality of diffraction electron beams are formed. A workpiece is irradiated with the transmission electron beam and the plurality of diffraction electron beams. A transmission spot and a plurality of diffraction pots are formed on a surface of the workpiece.SELECTED DRAWING: Figure 1
Inventors:
LIU PENG
CHO ISAMU
LIN XIAO-YANG
ZHOU DUANLIANG
ZHANG CHUN-HAI
JIANG KAILI
FAN SHOUSHAN
CHO ISAMU
LIN XIAO-YANG
ZHOU DUANLIANG
ZHANG CHUN-HAI
JIANG KAILI
FAN SHOUSHAN
Application Number:
JP2017112813A
Publication Date:
December 14, 2017
Filing Date:
June 07, 2017
Export Citation:
Assignee:
UNIV QINGHUA
HON HAI PREC IND CO LTD
HON HAI PREC IND CO LTD
International Classes:
H01J37/305; B23K15/00; H01J37/04; H01L21/027
Domestic Patent References:
| JP2014515695A | 2014-07-03 | |||
| JP2015014613A | 2015-01-22 | |||
| JP2006245096A | 2006-09-14 | |||
| JP2015107913A | 2015-06-11 |
Attorney, Agent or Firm:
try international patent corporation
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