Title:
ELECTRON BEAM SENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JPS53130033
Kind Code:
A
Abstract:
PURPOSE: To impart superior sensitivity, image characteristics and etching resistance to a negative type electron beam sensitive photographic material and improve the stability of an image after being irradiated with electron beams, by using a specified polymer having chalcone grups in its side chain.
Inventors:
KAWASHIMA KENICHI
SATOU JIYUNJI
MIURA KONOE
EGUCHI CHIHIRO
SATOU JIYUNJI
MIURA KONOE
EGUCHI CHIHIRO
Application Number:
JP4541977A
Publication Date:
November 13, 1978
Filing Date:
April 20, 1977
Export Citation:
Assignee:
FUJITSU LTD
MITSUBISHI CHEM IND
MITSUBISHI CHEM IND
International Classes:
G03F7/20; C08F20/00; C08F20/26; C08F220/16; G03F7/004; G03F7/038; G03G5/00; H01L31/08; H01L51/42; H05K1/00; (IPC1-7): C08F220/16; G03G5/00; H01L31/08; H05K1/00
Previous Patent: JPS53130032
Next Patent: REGISTRATION CORRECTING METHOD IN VARIABLE MULTIPLIFICATION COPIER
Next Patent: REGISTRATION CORRECTING METHOD IN VARIABLE MULTIPLIFICATION COPIER