To provide an electron discharge lithography device by using a selectively grown carbon nanotube electron discharge source, and to provide the lithography method.

An electron discharge lithography device includes an electron discharge source arranged in a chamber and a stage, where a sample 14 is placed by leaving a prescribed distance from the electron discharge source. The electron discharge source is constituted of the carbon nanotubes 11, having electron discharge functions and a carbon nanotube 11 is used as the electron discharge source of a lithography process. Thus, the lithography process for realizing marked fine line width with very high precision is given. Since electrons, discharged from the carbon nanotube 11 expose electron beam resists 15 and 15' in parts where they correspond by 1:1, deviation of an exposed state, which occurs between the center and the end part of the substrate 12, is suppressed to be low. Such a lithography is realized with high productivity.