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Title:
ELECTRON GUN FOR VAPOR DEPOSITION
Document Type and Number:
Japanese Patent JP2010018826
Kind Code:
A
Abstract:

To provide an electron gun for vapor deposition in which vapor-deposited particles generated from a vapor deposition material irradiated with electron beam is prevented from being deposited on a pole piece for deflecting the electron beam arranged on the electron gun.

A permanent magnet 14, a filament 16 for emitting thermoelectron, a scan coil unit 17 for scanning the electron beam on a vapor deposition material in the directions of X-axis and Y-axis and the like are arranged in a body case 20 made of a non-magnetic material and formed in a box shape. A pair of pole pieces 11a, 11b opposite to each other for forming the magnetic field for deflecting the electron beam, and a pair of pole pieces 12a, 12b opposite to each other for forming the magnetic field for adjusting the orbit of the electron beam are horizontally provided in the body case 20. An upper cover 21 made of a non-magnetic material and having a square opening 22 for emitting the electron beam is mounted on an upper part of the body case 20.


Inventors:
SUGITA KAORU
TAZAKI JUN
WAKATA HIROAKI
Application Number:
JP2008178704A
Publication Date:
January 28, 2010
Filing Date:
July 09, 2008
Export Citation:
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Assignee:
NISSHIN GIKEN KK
International Classes:
C23C14/30
Domestic Patent References:
JP2005276520A2005-10-06
JP2008063635A2008-03-21
JP2005048219A2005-02-24
Other References:
JPN6012051400; 前川茂樹, 西山寛之, 上岡昌典, 杉山修: '反射電子低減電子銃BS-60050EBSによる近紫外域低吸収膜の作製' 日本電子ニュース Vol.40, 2008, Page.58-60
JPN6012051401; 前川茂樹: '最新型電子銃の反射電子低減による紫外低吸収膜の作製' 第8回高機能膜フォーラム , 20071108
Attorney, Agent or Firm:
Kozo Uchida
Masahiro Tanaka