Title:
ELECTRON MICROSCOPE AND ADJUSTMENT METHOD
Document Type and Number:
Japanese Patent JP2019160464
Kind Code:
A
Abstract:
To provide an electron microscope which can reduce a damage to a target region by an electron beam and which enables observation and analysis under appropriate optical conditions.SOLUTION: An electron microscope comprises an optical system and a control part for controlling the optical system. The control part performs: a process of setting a plurality of adjustment regions 4a, 4b, 4c, 4d, 4e, 4f, 4g, 4h to acquire optical conditions of the optical system; a process of acquiring the optical conditions of the optical system for the plurality of adjustment regions 4a, 4b, 4c, 4d, 4e, 4f, 4g, 4h; a process of determining, on the basis of optical conditions of the optical system for the plurality of adjustment regions 4a, 4b, 4c, 4d, 4e, 4f, 4g, 4h, an optical condition of the optical system for a target region 2, which will make a target for observation or analysis of a sample; and a process of controlling the optical system on the basis of a determined optical condition of the optical system for the target region.SELECTED DRAWING: Figure 5
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Inventors:
HASHIGUCHI HIROKI
Application Number:
JP2018042153A
Publication Date:
September 19, 2019
Filing Date:
March 08, 2018
Export Citation:
Assignee:
JEOL LTD
International Classes:
H01J37/22; H01J37/26
Attorney, Agent or Firm:
Yukio Fuse
Mitsue Obuchi
Mitsue Obuchi