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Title:
ELECTRON MICROSCOPE, ITS SYSTEM, AND DIMENSION MEASURING METHOD USING THEM
Document Type and Number:
Japanese Patent JP2005322423
Kind Code:
A
Abstract:

To provide an electron microscope device and a dimension measuring method to reduce difference of measured values, which exists among electron microscope devices, or which is caused by an unadjustable resolution difference produced with the passage of time.

An operator to correct a change of an electron beam image which is caused by differences of probe diameters is found in advance from the electron beam image of the same reference sample obtained by an electron microscope device having different resolution (probe diameter), and the change is corrected by influencing it. Thereby, an electron beam image for measuring corrections which is equivalent to the electron beam image by the same probe diameter is produced, and it is used for dimension measurement.


Inventors:
Shishido, Chie
Nakagaki, Akira
Osaki, Mayuka
Kawada, Hiroki
Application Number:
JP2004000137025
Publication Date:
November 17, 2005
Filing Date:
May 06, 2004
Export Citation:
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Assignee:
HITACHI HIGH-TECHNOLOGIES CORP
International Classes:
G01B15/00; G01N23/00; G01N23/225; G21K7/00; H01J37/22; H01J37/28; H01J40/14; H01L21/66; (IPC1-7): H01J37/22; G01B15/00; H01J37/28; H01L21/66
Domestic Patent References:
JP2001202911A
JP2002117799A2002-04-19
JP2000171230A
JPH11224640A
JPH09306400A
JPH1140096A
JP2003121132A
JP2003100828A
JP2003142021A
Attorney, Agent or Firm:
小川 勝男
田中 恭助