Title:
ELECTRON REFLECTION SUPPRESSING MATERIAL AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2005032542
Kind Code:
A
Abstract:
To provide an electron reflection suppressing material having high electron reflection suppressing effect.
The electron reflection suppressing material 10 has a substrate 12 and a surface film covering the surface of of the substrate 12. The surface film is made of a plurality of fibrous carbon nanotubes 16 extending substantially in the vertical direction to the surface of substrate 12. The electron reflection suppressing material is made of a plurality of fibrous carbon nanotubes forming the surface film covering the surface of the substrate 1. Therefore, electron reflectance is remarkably lowered compared with the existing electron reflection suppressing material.
Inventors:
SAITO YAHACHI
Application Number:
JP2003195775A
Publication Date:
February 03, 2005
Filing Date:
July 11, 2003
Export Citation:
Assignee:
MIE TLO CO LTD
International Classes:
B82B1/00; C01B31/02; H01J9/14; H01J37/16; (IPC1-7): H01J37/16; B82B1/00; H01J9/14
Attorney, Agent or Firm:
Kaiyu International Patent Office
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