Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ELECTRON-SOURCE ARRAY AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2001236876
Kind Code:
A
Abstract:

To provide an electron-source array and a manufacturing method of it, that can give a structure enabling reduction of emission-start voltage and device-drive voltage of the electron-source array, and can simplify the manufacturing process for the electron-source array.

This electron-source array comprises filament-shaped electron sources 4 and fine particles 5 arranged in the gaps between the electron sources, and the fine particles are arranged and stuck into the gaps of the electron sources. The fine particles arranged into the gaps of the electron sources are composed of alumina, and the electron sources are composed of carbon nanotubes. In the manufacturing method, the electron sources are formed by using a filament-shaped mold. As the process to form the mold, an anode- oxidation process is used, and as the process for forming an electron source in the mold, a vapor phase carbonization process is used, desirably, an oxygen- plasma etching process and an alkaline wet-etching process, in which end-point is detected with a weight-variation monitor is used.


Inventors:
Tsunesada, Norimoto
Oki, Hiroshi
Tomita, Akira
Kyotani, Takashi
Application Number:
JP2000000048808
Publication Date:
August 31, 2001
Filing Date:
February 25, 2000
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SHARP CORP
International Classes:
H01J9/02; H01J1/304; H01J9/02; H01J1/30; (IPC1-7): H01J1/304; H01J9/02