Title:
ELECTRON SOURCE STABILIZATION METHOD AND ELECTRON BEAM APPARATUS
Document Type and Number:
Japanese Patent JP2020119762
Kind Code:
A
Abstract:
To provide an electron source stabilization method of stabilizing an emission current only by field evaporation without introducing a gas.SOLUTION: LaBis used as an electron source to generate an electron beam, the electron source is stabilized by applying, to the electron source, a pulse voltage in which the electric field is in the opposite direction, and the absolute value of the voltage is 4 times or more compared to a voltage applied to the electron source when an electron beam is generated .SELECTED DRAWING: Figure 2
Inventors:
ZHANG HAN
TO SHO
NIWATA AKIRA
JIMBO YU
KITAMURA SHINICHI
MANABE HIRONOBU
TO SHO
NIWATA AKIRA
JIMBO YU
KITAMURA SHINICHI
MANABE HIRONOBU
Application Number:
JP2019010067A
Publication Date:
August 06, 2020
Filing Date:
January 24, 2019
Export Citation:
Assignee:
NAT INST MATERIALS SCIENCE
JEOL LTD
JEOL LTD
International Classes:
H01J1/304; H01J27/26; H01J37/06; H01J37/073
Domestic Patent References:
| JPH03274642A | 1991-12-05 | |||
| JP2008060037A | 2008-03-13 |
Foreign References:
| WO2018070010A1 | 2018-04-19 |
Attorney, Agent or Firm:
Shinto International Patent Office