Title:
電子ビーム露光装置、偏向装置、及び電子ビーム露光方法
Document Type and Number:
Japanese Patent JP4220209
Kind Code:
B2
Abstract:
An electron beam exposure apparatus for exposing a wafer by an electron beam incorporates a circuit structure for conducting a scan test to self-diagnose the electrical connections. The electron beam exposure apparatus includes: an electron beam generating section for generating the electron beam; a plurality of deflectors for deflecting the corresponding electron beams; a deflection control section for outputting a deflection control signal for causing the deflector to deflect the electron beam; and a control signal storage section for storing a value of the deflection control signal output from the deflection control section. The control signal storage section connects the plurality of deflectors in series when conducting the scan test. The control signal storage section and the deflector may be monolithically integrated on a semiconductor substrate.
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Inventors:
Shinichi Hashimoto
Haruo Yoda
Masato Muraki
Haruo Yoda
Masato Muraki
Application Number:
JP2002284254A
Publication Date:
February 04, 2009
Filing Date:
September 27, 2002
Export Citation:
Assignee:
Advantest Corporation
Canon Inc
Canon Inc
International Classes:
G03F7/20; H01L21/027; H01J3/14; H01J37/147; H01J37/302; H01J37/305; H01J37/317
Domestic Patent References:
| JP3174715A | ||||
| JP2174215A | ||||
| JP11186144A | ||||
| JP11317357A | ||||
| JP10289843A |
Attorney, Agent or Firm:
Akihiro Ryuka