Title:
ELECTRONIC BEAM EXPOSURE METHOD
Document Type and Number:
Japanese Patent JPS5694739
Kind Code:
A
Abstract:
PURPOSE:To prevent a deflection accuracy from lowering because of a charged pulluted material sticked to an electrostatic deflecting device by a method wherein a metallic plate having fine holes through which full electronic beams deflected by an electrostatic deflecting device pass is arranged near the electrostatic deflecting device. CONSTITUTION:A variable rectangular electronic beam exposure device is composed of an electron gun 1, an aberration lens 2, rectangular slits 3, 6 an electronic lens 4, an image forming position controlling electrostatic deflecting device 4, a reduction lens 7, a beam open angle limitation throttle valve 8, an objective 9, a positioning electromagnetic polariscope 10, a positioning electrostatic polariscope 11, a glass substrate 12 on which an electronic ray photo sensing resist is applied, an XY stage 13, and a metallic plate provided with fine holes. The metallic plate 20 provided with fine holes is arranged near the electrostatic polariscope and the electronic beam reflected from the apparatus arranged at a lower part is prevented from reaching the deflecting device, thus, the deflection accuracy to the electrostatic deflecting device due to a charge accumulation is prevented from lowering.
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Inventors:
OSADA TOSHIHIKO
MIYAZAKI TAKAYUKI
MIYAZAKI TAKAYUKI
Application Number:
JP17106479A
Publication Date:
July 31, 1981
Filing Date:
December 28, 1979
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
H01L21/027; H01J37/30; (IPC1-7): H01L21/30
Domestic Patent References:
| JPS5279662A | 1977-07-04 | |||
| JPS5471992A | 1979-06-08 |