Title:
半導体デバイス上に材料を選択的に堆積させる電気泳動プロセス
Document Type and Number:
Japanese Patent JP4490073
Kind Code:
B2
Abstract:
The coating method uses a bath containing suspended particles in which the semiconductor element is placed, with application of a first voltage between an anode within the bath and the p-conductivity side (84) of the semiconductor element and a second voltage between the p-conductivity side and the n-conductivity side of the semiconductor element. Also included are Independent claims for the following: (a) a system for coating a semiconductor element; (b) a method for coating a light-emitting diode
Inventors:
Christopher Jay Summers
Menkara Hisham
Be In Janet Chua
Menkara Hisham
Be In Janet Chua
Application Number:
JP2003354467A
Publication Date:
June 23, 2010
Filing Date:
October 15, 2003
Export Citation:
Assignee:
Avago Technologies General IP (Singapore) Private Limited
Phosphor Tech Corporation
Phosphor Tech Corporation
International Classes:
H01L33/00; H01L21/368; H01L33/50; H01L33/44
Foreign References:
| WO2002001649A1 |
Attorney, Agent or Firm:
Satoshi Furuya
Takahiko Mizobe
Kiyoharu Nishiyama
Takahiko Mizobe
Kiyoharu Nishiyama