PURPOSE: To prevent the peeling of an amorphous silicon layer, and to improve the durability of the titled body by providing a nickel thin film layer between a substrate and the amorphous silicon layer.
CONSTITUTION: The nickel layer 10 is formed on the substrate 1 having ≤1mm a thickness according to a vacuum deposition method or a sputtering method. A sheet like flexible sensitive body is prepared by laminating the amorphous silicon layer 2 on the nickel layer 10. The thickness of the nickel layer 10 is a range of 100W10,000. The substrate 1 comprises a stainless steel, chro nium, titanium, aluminum, a nickel-chronium alloy, a polyimide, a polyether sulfone and a polyethylene etc. Thus, the sticking property of between the amorphous silicon layer and the substrate, and the durability of the titled body may be greatly improved by providing the nickel thin film between the substrate and the amorphous silicon layer.
FUJITA NOBUHIKO
NAKAGAMA SHOJI
